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Free radical addition of tosyl bromide to a solid-supported alkene; bromo-alkyl sulfones

SyntheticPage 134
DOI: 10.1039/SP134
Submitted Aug 24, 2001, published Aug 24, 2001
Daniel Hamza (danielhamza@yahoo.co.uk)
A contribution from Caddick, Sussex


			Reaction Scheme: Free radical addition of tosyl bromide to a solid-supported alkene

Chemicals Used

tosyl bromide (p-toluene sulfonyl bromide, prepared as described Page 18)
AIBN (azoisobutyronitrile) recrystallised from methanol from crude.
toluene, (anhydrous from CaH2 or dry from Aldrich)
Wang-linked 5-hexenoic acid (prepared as for SP: 88)

Procedure

p-Toluenesulfonyl bromide (6eq, 0.6mmol, 142mg) and AIBN (6eq, 0.6mmol, 98mg) were pre-dissolved in dry toluene (1ml) and added to polystyrene resin-linked 5-hexenoic acid (1eq, 0.1mmol, 0.72mmol/g, 139mg). The reaction was performed in a 3ml ReactivialTM at 65-70oC with stirring for 20h and allowed to cool to room temperature. The resin was then transferred to a filter tube and washed with DCM, DMF, THF 6 x 10mL each; 3 x 10mL each of DMSO, glacial acetic acid, 20% DIPEA/DMF. Final washes in THF. Cleaved with 3ml 95% TFA(aq) for 2.5 hours. Washed through with DCM and THF and dried under stream of nitrogen and then overnight in vacuum oven at 30oC. Yield: 32.5mg, 93%, colourless oil.

Author's Comments

This reaction has been repeated about 4 times on this scale only, with yields consistently high for this Wang polystyrene-linked alkene acceptor. We did have problems associated with the removal of some tosyl-related impurities that did not wash off the resin and were only released by the TFA cleavage step. This problem was overcome by washing the resin with 20% DIPEA/DMF as descibed above. Prolonged washing in these basic conditions did lead to trace amounts of the elimination product so keep the washes to < 1min in the basic solution. The washes with DMSO and acetic acid were probably a bit excessive and unnecessary. The reaction vessels used: ReactivialsTM, are available from Pierce Warriner and are a good choice when doing small scale solid phase reactions that require heating since the resin is concentrated in one small volume and is relatively easy to transfer to an AlltechTM tube for washing steps. See links to other synthetic pages below for how to make tosyl bromide and other related chemistry.

Data

1H NMR (MeOD) (300MHz) delta (ppm): 7.86 (d, J=8Hz, 2H, Ts H2 & H6), 7.50 (d, J=8Hz, 2H, Ts H3 & H5), 4.30-4.36 (m, 1H, H5), 3.85 (app. d, J=6.0Hz, 2H, H6+H6'), 2.50 (s, 3H, CH3-Ar), 2.32 (m, 2H, H2), 2.08-2.16 (m, 1H, H4/H4'), 1.82-1.94 (m, 2H, H3/H3' + H4/H4'), 1.67-1.74 (m, 1H, H3/H3'). 13C NMR (MeOD): 177.2, 147.2, 138.2, 131.6, 129.8, 64.7, 46.5, 39.0, 34.2, 24.0, 22.1. MS (ES+) [M]+ 349, 347.

Lead Reference

1. Caddick, S.; Hamza, D.; Wadman, S.N. Tetrahedron Lett. 1999, 40, 7285-7288.

Other References

Linking acceptor to solid support: Page 88; Solution phase addition of TsBr to alkynes Page 48; Preparation of Tosyl Bromide: Page 18. Addition of tosyl bromide and tosyl iodide to allenes see: Suk-Ku Kang, Byung-Soo Ko, and Young-Hwan Ha, J. Org. Chem., 2001; 66(10); 3630-3633.

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Keywords: solid phase, resin, alkene, tosyl, toluene sulfonyl, tosyl bromide, solid support, polystyrene, intermolecular radical additions, 134